
SiC has excellent heat resistance, corrosion resistance, oxidation resistance, and thermal shock resistance.
Thus, it is a promising material for use in high-temperature semiconductors, high-temperature structures, and semiconductor members.
The chemically vapor-deposited SiC and CVD-SiC manufactured through chemical vapor using vapor, including Si or C to directly form SiC solids from the vapor without going through a sintering process to get precise and highly pure SiC without additives of sintering at a low temperature of 1200-1500¡É.
CVD-SiC is used in various areas and mainly in susceptors to process semiconductor wafers, wear-resistant coating, optics high-energy mirrors, solar concentrators, telescope mirrors to view celestial bodies, and large lightweight mirrors.
Thus, it is a promising material for use in high-temperature semiconductors, high-temperature structures, and semiconductor members.
The chemically vapor-deposited SiC and CVD-SiC manufactured through chemical vapor using vapor, including Si or C to directly form SiC solids from the vapor without going through a sintering process to get precise and highly pure SiC without additives of sintering at a low temperature of 1200-1500¡É.
CVD-SiC is used in various areas and mainly in susceptors to process semiconductor wafers, wear-resistant coating, optics high-energy mirrors, solar concentrators, telescope mirrors to view celestial bodies, and large lightweight mirrors.

